The first supplier of nano-twin copper electroplating chemicals in the world.
Supplier of high-quality etchants. Used in semiconductor fabrication, high-end IC packaging, optoelectronic industry, as well as wafer thinning/ roughening/ polishing / stress-release processes. Variety of etching rates or tailored performances available to meet the requirements of different production processes. Features include high etching selectivity, low undercut, high bath loading/bath life, ease of handling, low cost, and ease of disposal for process waste liquids. Suitable for wet bench and spin tool machines.
CLC is a leading supplier in Taiwan, known for being the first to mass-produce photoresist strippers with eco-friendly formulations. In 2017, we launched our first eco-friendly photoresist stripper product which has been in mass-production ever since.
Nanotwinned copper electroplating chemicals
The (111)nt-Cu Electroplating Solution adds special additives to the Cu electroplating solution to deposit a copper coating with a patented Cu micro-structure using the electrochemical electroplating process.
CLC offers a range of wet process chemicals designed for use in various semiconductor and optoelectronic applications. These chemicals include cleaners, Si etchants, Ag etchants, NiV etchants, and TiW etchants, among others.
We offer wet process equipment for advanced packaging.We specialize in the development and production of high-precision etchants, eco-friendly photoresist strippers, and nano-twin copper electroplating solutions.
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Formulation Chemicals for Wet Processes
Semiconductor IC-Production Supply Chain