Other

  1. Other
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    Cleaner

    Cleaning is an essential process that is required at various stages of the semiconductor production process. CLC offers a wide range of cleaners specifically designed for different applications.
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    Ag Etchant

    CLC offers both phosphoric acid and nitric acid series Ag etchants that are compatible with both wet bench and spin process tools.
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    NiV Etchant

    CLC offers nitric acid series NiV etchants for use in wet bench and spin process machines, which can be utilized in both NiV/Cu etching processes.
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    Si Etchant

    CLC supplies potassium hydroxide (KOH) series anisotropic silicon (Si) etchants for use in MEMS and TSV reveal processes.
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    TiW Etchant

    CLC supplies high-quality Titanium-Tungsten (TiW) etchants for gold bump process.